Unidirectional spin torque transfer magnetic memory cell structure

ABSTRACT

Spin torque transfer magnetic random access memory devices configured to be programmed unidirectionally and methods of programming such devices. The devices include memory cells having two pinned layers and a free layer therebetween. By utilizing two pinned layers, the spin torque effect on the free layer from each of the two pinned layers, respectively, allows the memory cells to be programmed with unidirectional currents.

BACKGROUND

1. Field of Invention

The invention relates generally to magnetic random access memory, andmore particularly, to Spin Torque Transfer Magnetic Random Access Memory(STT-MRAM).

2. Description of Related Art

This section is intended to introduce the reader to various aspects ofthe art that may be related to various aspects of the present invention,which are described and/or claimed below. This discussion is believed tobe helpful in providing the reader with background information tofacilitate a better understanding of the various aspects of the presentinvention. Accordingly, it should be understood that these statementsare to be read in this light and not as admissions of prior art.

Magnetic Random Access Memory (MRAM) is a non-volatile computer memorytechnology based on magnetoresistance. MRAM differs from volatile RandomAccess Memory (RAM) in several respects. Because MRAM is non-volatile,MRAM can maintain memory content when the memory device is not powered.Though non-volatile RAM is typically slower than volatile RAM, MRAM hasread and write response times that are comparable to that of volatileRAM. Unlike typical RAM technologies which store data as electriccharge, MRAM data is stored by magnetoresistive elements. Generally, themagnetoresistive elements are made from two magnetic layers, each ofwhich holds a magnetization. The magnetization of one layer (the “pinnedlayer”) is fixed in its magnetic orientation, and the magnetization ofthe other layer (the “free layer”) can be changed by an externalmagnetic field generated by a programming current. Thus, the magneticfield of the programming current can cause the magnetic orientations ofthe two magnetic layers to be either parallel, giving a lower electricalresistance across the layers (“1” state), or antiparallel, giving ahigher electrical resistance across the layers (“0” state). Theswitching of the magnetic orientation of the free layer and theresulting high or low resistance states across the magnetic layersprovide for the write and read operations of the typical MRAM cell.

Though MRAM technology offers non-volatility and faster response times,the MRAM cell is limited in scalability and susceptible to writedisturbances. The programming current employed to switch between highand low resistance states across the MRAM magnetic layers is typicallyhigh. Thus, when multiple cells are arranged in an MRAM array, theprogramming current directed to one memory cell may induce a fieldchange in the free layer of an adjacent cell. This potential for writesdisturbances, also known as the “half-select problem,” can be addressedusing a spin torque transfer technique.

A conventional spin torque transfer MRAM (STT-MRAM) cell includes amagnetic tunnel junction (MTJ), which is a magnetoresistive data storingelement including two magnetic layers (one pinned and one free) and aninsulating layer in between, a bit line, a word line, a source line, andan access transistor. A programming current typically flows through theaccess transistor and the MTJ. The pinned layer polarizes the electronspin of the programming current, and torque is created as thespin-polarized current passes through the MTJ. The spin-polarizedelectron current interacts with the free layer by exerting a torque onthe free layer. When the torque of the spin-polarized electron currentpassing through the MTJ is greater than the critical switching currentdensity (J_(c)), the torque exerted by the spin-polarized electroncurrent is sufficient to switch the magnetization of the free layer.Thus, the magnetization of the free layer can be aligned to be eitherparallel or antiparallel to the pinned layer, and the resistance stateacross the MTJ is changed.

The STT-MRAM has advantageous characteristics over the MRAM because thespin-polarized electron current eliminates the need for an externalmagnetic field to switch the free layer in the magnetoresistiveelements. Further, scalability is improved as the programming currentdecreases with decreasing cell sizes, and the writing disturbance andhalf-select problem is addressed. Additionally, STT-MRAM technologyallows for a higher tunnel magnetic resistance ratio, meaning there is alarger ratio between high and low resistance states, improving readoperations in the magnetic domain.

However, the STT-MRAM cell structure utilizes programming currents ofbidirectional polarity to program the magnetic cell into the high andlow resistance states. Bidirectional programming logic requires moresilicon space to form the memory cell and is generally more complicatedand less efficient than unidirectional programming logic.

BRIEF DESCRIPTION OF DRAWINGS

Certain embodiments are described in the following detailed descriptionand in reference to the drawings in which:

FIG. 1 depicts a block diagram of a processor-based system in accordancewith an embodiment of the present technique;

FIG. 2 depicts a schematic diagram of a portion of a memory array havingmemory cells fabricated in accordance with embodiments of the presentinvention;

FIG. 3 depicts a portion of a STT-MRAM cell in accordance withembodiments of the present invention;

FIG. 4 depicts a chart relating programming current and net spinpolarization of a memory cell in accordance with embodiments of thepresent invention;

FIG. 5 depicts a portion of a STT-MRAM cell with an additional magnetictunnel junction, as well as portions of STT-MRAM cells in low and highresistance states, in accordance with embodiments of the presentinvention;

FIGS. 6-11 depict portions of STT-MRAM cells in accordance with variousembodiments of the present invention; and

FIG. 12 depicts a portion of a memory array implementing cross pointarchitecture in accordance with embodiments of the present invention.

DETAILED DESCRIPTION

A spin torque transfer magnetic random access memory (STT-MRAM) cell isprogrammed by switching the magnetization of the free layer in thecell's magnetic tunnel junction (MTJ). A programming current ofbidirectional polarity is generally utilized to switch the magnetizationof the free layer and program the cell. However, a STT-MRAM cell that iscapable of being programmed into high and low resistance states with aunidirectional current would be more efficient and require less siliconspace than the conventional bidirectional STT-MRAM cell. In accordancewith embodiments of the present invention, a STT-MRAM cell structure maybe designed to create an imbalance between two opposing spin torquetransfer effects to enable unidirectional current programming. Thefollowing discussion describes the systems and devices, and theoperation of such systems and devices in accordance with the embodimentsof the present technique.

FIG. 1 depicts a processor-based system, generally designated byreference numeral 10. As is explained below, the system 10 may includevarious electronic devices manufactured in accordance with embodimentsof the present technique. The system 10 may be any of a variety of typessuch as a computer, pager, cellular phone, personal organizer, controlcircuit, etc. In a typical processor-based system, one or moreprocessors 12, such as a microprocessor, control the processing ofsystem functions and requests in the system 10. As is explained below,the processor 12 and other subcomponents of the system 10 may includeresistive memory devices manufactured in accordance with embodiments ofthe present technique.

The system 10 typically includes a power supply 14. For instance, if thesystem 10 is a portable system, the power supply 14 may advantageouslyinclude a fuel cell, a power scavenging device, permanent batteries,replaceable batteries, and/or rechargeable batteries. The power supply14 may also include an AC adapter, so the system 10 may be plugged intoa wall outlet, for instance. The power supply 14 may also include a DCadapter such that the system 10 may be plugged into a vehicle cigarettelighter, for instance.

Various other devices may be coupled to the processor 12 depending onthe functions that the system 10 performs. For instance, a userinterface 16 may be coupled to the processor 12. The user interface 16may include buttons, switches, a keyboard, a light pen, a mouse, adigitizer and stylus, and/or a voice recognition system, for instance. Adisplay 18 may also be coupled to the processor 12. The display 18 mayinclude an LCD, an SED display, a CRT display, a DLP display, a plasmadisplay, an OLED display, LEDs, and/or an audio display, for example.Furthermore, an RF sub-system/baseband processor 20 may also be coupledto the processor 12. The RF sub-system/baseband processor 20 may includean antenna that is coupled to an RF receiver and to an RF transmitter(not shown). One or more communication ports 22 may also be coupled tothe processor 12. The communication port 22 may be adapted to be coupledto one or more peripheral devices 24 such as a modem, a printer, acomputer, or to a network, such as a local area network, remote areanetwork, intranet, or the Internet, for instance.

The processor 12 generally controls the system 10 by implementingsoftware programs stored in the memory. The software programs mayinclude an operating system, database software, drafting software, wordprocessing software, and/or video, photo, or sound editing software, forexample. The memory is operably coupled to the processor 12 to store andfacilitate execution of various programs. For instance, the processor 12may be coupled to the system memory 26, which may include spin torquetransfer magnetic random access memory (STT-MRAM), magnetic randomaccess memory (MRAM), dynamic random access memory (DRAM), and/or staticrandom access memory (SRAM). The system memory 26 may include volatilememory, non-volatile memory, or a combination thereof. The system memory26 is typically large so that it can store dynamically loadedapplications and data. In some embodiments, the system memory 26 mayinclude STT-MRAM devices, such as those discussed further below.

The processor 12 may also be coupled to non-volatile memory 28, which isnot to suggest that system memory 26 is necessarily volatile. Thenon-volatile memory 28 may include STT-MRAM, MRAM, read-only memory(ROM), such as an EPROM, resistive read-only memory (RROM), and/or flashmemory to be used in conjunction with the system memory 26. The size ofthe ROM is typically selected to be just large enough to store anynecessary operating system, application programs, and fixed data.Additionally, the non-volatile memory 28 may include a high capacitymemory such as a tape or disk drive memory, such as a hybrid-driveincluding resistive memory or other types of non-volatile solid-statememory, for instance. As is explained in greater detail below, thenon-volatile memory 28 may include STT-MRAM devices manufactured inaccordance with embodiments of the present technique.

FIG. 2 illustrates an STT-MRAM cell 50, which may be fabricated to forman array of memory cells in a grid pattern including a number of rowsand columns, or in various other arrangements depending on the systemrequirements and fabrication technology. An arrangement of memory cellsmay be implemented in the system memory 26 or the volatile memory 28depicted in FIG. 1.

The STT-MRAM cell 50 includes a stack 52, an access transistor 54, a bitline 56, a word line 58, a source line 60, read/write circuitry 62, abit line reference 64, and a sense amplifier 66. The stack 52 mayinclude a magnetic tunnel junction (MTJ), including a free layer, and apinned layer. As will be described further below with specific referenceto FIGS. 3 and 5-11, the “stack” 52 may refer to multiple free layersand pinned layers, a heat generating layer, a piezoelectric material,nonmagnetic layers, and additional MTJ components in accordance withembodiments of the present technique.

In various embodiments described below, the heat generating layer isreferred to as a “layer” when the material is formed above or below theMTJ or a pinned layer in the stack, or parallel to the layers of the MTJor stack. As also used herein, it should be understood that when a layeris said to be “formed on” or “disposed on” another layer, there may beintervening layers formed or disposed between those layers. Similarly,if materials are said to be “adjacent” to other materials, there may beintervening materials therebetween. Conversely, if a layer or materialis said to be “formed directly on,” “disposed directly on,” orformed/disposed “directly adjacent to” or “in direct contact with,” thematerials or layers include no intervening materials or layerstherebetween.

When the STT-MRAM cell 50 is selected to be programmed, a programmingcurrent is applied to the cell, and the current is spin-polarized by oneof the pinned layers and exerts a torque on the free layer, whichswitches the magnetization of the free layer to “write to” or “program”the cell. In a read operation of the STT-MRAM cell 50, a current is usedto detect the resistance state of the memory cell stack 52. Further,incorporating a piezoelectric layer in the stack 52 may decrease thecritical switching current required to switch the magnetization of thefree layer, thus allowing a smaller programming current to write theSTT-MRAM cell 50.

As previously discussed, a programming current (or a “write current”) isapplied for the write operation of the STT-MRAM cell 50. To initiate thewrite operation, the read/write circuitry 62 may generate a writecurrent to the bit line 56. As will be further described, the currentdensity of the write current determines the switch in magnetization ofthe free layer in the stack 52. Once the free layer is magnetizedaccording to the current density of the programming current, theprogrammed state is written to the STT-MRAM cell 50. Thus, the STT-MRAMcell 50 may be programmed by a unidirectional current, enabling asimpler unidirectional programming logic on the STT-MRAM cell 50. Theconventional STT-MRAM cell changes between low and high resistancestates by driving a write current in opposite directions, requiringbidirectional programming logic. For example, a write current would bedriven from a transistor source to a transistor drain, and then througha MTJ to program the memory cell to a high resistance state. To programa memory cell to a low resistance state, a write current would be drivenfrom a MTJ to a transistor drain to a transistor source. In theembodiments in accordance with the present technique, such bidirectionalprogramming logic may not be necessary, as a unidirectional current mayprogram the STT-MRAM cell 50. As will be explained in FIG. 12, in someembodiments, the STT-MRAM cell 50 may be implemented in a cross pointarchitecture to decrease the size of a STT-MRAM array.

To read the STT-MRAM cell 50, the read/write circuitry 62 generates aread current to the bit line 56 and the source line 60 through the stack52 and the transistor 54. The programmed state of the STT-MRAM cell 50depends on the resistance across the stack 52 which may be determined bythe voltage difference between the bit line 56 and the source line 60.In some embodiments, the voltage difference may be compared to areference 64 and amplified by a sense amplifier 66.

One embodiment of the present invention, a STT-MRAM cell capable ofbeing programmed by a unidirectional current, is depicted in FIG. 3.Each of the stacks illustrated and described below may be incorporatedin the STT-MRAM cell 50, described in FIG. 2. The STT-MRAM cell stack100 includes a top pinned layer 102, separated from a free layer 106 bya top nonmagnetic layer 104, and a bottom pinned layer 110, separatedfrom the free layer 106 by a bottom nonmagnetic layer 108. As discussedfurther below, the pinned layers 102 and 110 and the free layer 106 aretypically ferromagnetic materials. The top and bottom nonmagnetic layers104 and 108 may serve as insulators between the free layer 106 and thetop and bottom pinned layers 102 and 110. The memory cell stack 100 mayalso include a heat generating layer 112.

The memory cell may be programmed by switching the magnetization of thefree layer 106 in the memory cell stack 100, and the cell may be read bydetermining the resistance across the top pinned layer 102, the freelayer 106 and the bottom pinned layer 110. The unidirectional arrowillustrated in each of the top pinned layer 102 and the bottom pinnedlayer 110 represent that the pinned layers 102 and 110 have a fixedmagnetization. Furthermore, the magnetization of the top pinned layer102 and the bottom pinned layer 110 are orientated in the samedirection. The bidirectional arrow illustrated in the free layer 106represents that the free layer 106 may be switched to have amagnetization in a direction parallel to the bottom pinned layer 110,which gives a low resistance, or in a direction antiparallel to thebottom pinned layer 110, which gives a high resistance.

The structure of the cell stack 100 and the parallel magnetizations ofthe top pinned layer 102 and the bottom pinned layer 110 may enable thememory cell to be programmed with a unidirectional current. Morespecifically, when a memory cell is selected to be programmed to a lowresistance state, a programming current 114 is applied to the cell. Theprogramming current 114 used to program the stack 100 to a lowresistance state may be in the range of about 20 microamperes to about 1miliampere. As the programming current 114 travels through stack 100,the electron spin of the programming current 114 is first polarized bythe bottom pinned layer 110. When the spin polarized programming current114 then reaches the free layer 106, it aligns the free layer 106 tohave the same magnetization as the bottom pinned layer 110. If thecurrent continues to the top pinned layer 102, the magnetization of thetop pinned layer 102 will not change since the programming current 114was polarized in the same direction by the bottom pinned layer 110. Themagnetization of the free layer 106 is the same as the magnetization ofthe bottom pinned layer 110, and the memory cell is programmed to a lowresistance state.

If the memory cell is selected to be programmed to a high resistancestate, a larger programming current 114 travels through stack 100. Theprogramming current 114 used to program the stack 100 to a highresistance state may be in the range of about 50 microamperes to about1.5 miliampere. The larger current may generate greater heat in the heatgenerating layer 112 to locally heat up the bottom pinned layer 110 toreduce its magnetization and spin polarization efficiency. Though theheat generating layer 112 is shown in this embodiment as a means ofmodulating the spin torque effect of the bottom pinned layer 110, thisembodiment and other embodiments of the present technique may alsoimplement other approaches or combinations of different approaches formodulating the imbalance between the opposing spin torques. For example,some embodiments may use voltage-induced stress, including but notlimited to using piezoelectric materials within the STT-MRAM cell.

Since the bottom pinned layer 110 has decreased magnetization and spinpolarization efficiency in response to the larger programming current114, the programming current will pass the bottom pinned layer 110either unpolarized or not highly polarized. The programming current 114will then travel through the free layer 106 and to the top pinned layer102. The top pinned layer 102 will reflect the electrons of theprogramming current 114 that have spin polarized to the oppositedirection of the magnetization of the top pinned layer 102. Thereflected electrons with spin polarization opposite from the top pinnedlayer 102 will then switch the magnetization of the free layer 106 suchthat the magnetization of the free layer 106 is antiparallel to themagnetization of both the top and the bottom pinned layers 102 and 110,and the memory cell is programmed to a high resistance state.

Thus, a unidirectional current may program a memory cell to either a lowresistance state or a high resistance state. The spin torque effect onthe free layer 106 from the current polarized by the bottom pinned layer110 is opposite to the spin torque effect on the free layer 106 from thecurrent reflected by the top pinned layer 102. The structure of thestack 100 in this embodiment and the parallel magnetization of the twopinned layers 102 and 110 enable the spin torque effect of the bottompinned layer 102 to dominate at a low current density, and the spintorque effect of the top pinned layer 102 to dominate at a high currentdensity. Therefore, the programming current 114 need only be varied incurrent density, and not in direction.

The top pinned layer 102, free layer 106, and bottom pinned layer 110may comprise ferromagnetic materials, including but not limited tomaterials such as Co, Fe, Ni or its alloys, NiFe, CoFe, CoNiFe, or dopedalloys CoX, CoFeX, CoNiFeX (X═B, Cu, Re, Ru, Rh, Hf, Pd, Pt, C), orother half-metallic ferromagnetic material such as Fe3O4, CrO2, NiMnSband PtMnSb, and BiFeO. The heat generating layer 112 may compriserefractory metals including, for example, nitride, carbide, and Boride,TiN, ZrN, HfN, VN, NbN, TaN, TiC, ZrC, HfC, VC, NbC, TaC, TiB2, ZrB2,HfB2, VB2, NbB2, TaB2, Cr3C2, Mo2C, WC, CrB2, Mo2B5, W2B5, or compoundssuch as TiAlN, TiSiN, TiW, TaSiN, TiCN, SiC, B4C, WSix, MoSi2, orelemental materials such as doped silicon, carbon, Pt, Niobium,Tungsten, molybdenum, or metal alloys such as NiCr, for example. The topnonmagnetic layer 104 and bottom nonmagnetic layer 108 can be eitherconductive or nonconductive. In some embodiments, conductive nonmagneticlayers may comprise Cu, Au, Ta, Ag, CuPt, CuMn, or other nonmagnetictransition metals, or any combination of the above nonmagneticconductive materials. Nonconductive nonmagnetic layers may compriseAl_(x)O_(y), MgO, AlN, SiN, CaO_(x), NiO_(x), HfO₂, Ta₂O₅, ZrO₂,NiMnO_(x), MgF₂, SiC, SiO₂, SiO_(x)N_(y), or any combination of theabove nonmagnetic nonconductive materials.

The chart illustrated in FIG. 4 represents the relationship between anapplied programming current and the net spin polarization between thefree and pinned layers, according to one embodiment of the presentinvention. The positive values in the net spin polarization axisrepresent that the free layer is parallel to the bottom pinned layer.This condition results when the programming current is smaller, and thespin torque from the bottom pinned layer dominates and switches the freelayer to be parallel to the bottom pinned layer. The negative values inthe net spin polarization axis represent that the free layer isantiparallel to the bottom pinned layer. This condition results when theprogramming current is larger, and local heating decreases the spintorque from the bottom layer, such that the spin torque from the toppinned layer dominates and reflects the polarized electron current thatswitches the free layer to be antiparallel to the bottom pinned layer.

As previously discussed, the nonmagnetic layers separating a free layerfrom a pinned layer in a STT-MRAM cell stack can be conductive ornonconductive. Furthermore, a memory cell stack may comprise acombination of conductive or nonconductive nonmagnetic layers. If eitheror both of the nonmagnetic layers are nonconductive, the memory cellstack may provide a good sensing margin, meaning that the separationbetween the two programmable states of low and high resistivity aregreater. For example a desirable resistance ratio in some embodimentsmay range from 100-300%. However, it may sometimes be advantageous toconstruct a memory cell where all the nonmagnetic layers are conductive.In such embodiments, the resistance change may not be as large as amemory cell with nonconductive nonmagnetic layers. Adding a magnetictunnel junction (MTJ) may improve the sensing margin, or increase theresistance change of a memory cell.

FIG. 5 illustrates one embodiment of the present invention whichincludes an additional MTJ to improve the sensing margin of a memorycell. The memory cell stack 200 includes a bottom unidirectionalprogramming stack 204 with a programming free layer 220 stacked betweena top pinned layer 216 and a bottom pinned layer 224. The bottomunidirectional programming stack 204 may further include a topnonmagnetic layer 218 between the programming free layer 220 and the toppinned layer 216, and a bottom nonmagnetic layer 222 between theprogramming free layer 220 and the bottom pinned layer 224. Thenonmagnetic layers 218 and 222 may be either conductive ornonconductive, and may insulate the magnetization of the surroundinglayers. When a low programming current passes through from the bottom ofthe stack 200, the bottom pinned layer may spin polarize the current,and the spin polarized programming current switches the magnetization ofthe programming free layer 220. When a high programming current passesthrough from the bottom of the stack 200, the larger heat from thelarger current and the heat generated by the heat generating layer 226decrease the magnetization of the bottom pinned layer 224 such that theprogramming current, still non-polarized or not highly polarized,travels to the top pinned layer 216 where it is spin polarized andreflected back to the programming free layer 220 to switch theprogramming free layer 220 to be antiparallel to the bottom pinned layer224. The original portion 204 may further comprise an antiferromagneticlayer 214 on top of the top pinned layer 216 to help pin the top pinnedlayer 216 and maintain its magnetization and stability.

The memory cell stack 200 may also comprise an additional MTJ 202, witha pinned layer 206 and a sensing free layer 210 separated from pinnedlayer 206 by a nonmagnetic barrier layer 208. The additional MTJ 202 mayimprove the sensing margin and increase the resistance ratio of thememory cell. The additional MTJ 202 is magnetostatically coupled to beantiparallel to a programming free layer 220 in the bottomunidirectional programming stack 204, such that changing themagnetization of the programming free layer 220 will change themagnetization of the sensing free layer 210. Further, the additional MTJ202 may be separated from the bottom unidirectional programming stack204 by a spin randomizing separation layer 212. The spin randomizingseparation layer 212 randomizes the spin of the programming current andmay eliminate or reduce any coupling effects between the sensing freelayer 210 and the antiferromagnetic layer 214.

The antiparallel magnetostatic coupling of the sensing free layer 210 tothe programming free layer 220 may improve the sensing margin and theresistance ratio between the two programmed states. The two programmedstates include a low resistance state 230 and a high resistance state260. In the low resistance state 230, the programming current is spinpolarized by the bottom pinned layer 234 and switches the magnetizationof the programming free layer 232 to be parallel to the magnetization ofthe bottom pinned layer 234. In the high resistance state 260, theprogramming current travels through the bottom pinned layer 268 and isspin polarized by the top pinned layer 262 and reflected to switch theprogramming free layer 264 in a magnetization antiparallel to the bottompinned layer 266.

FIG. 6 illustrates one embodiment where an antiferromagnetic layer 314is added to the memory cell stack 300 to help pin the bottom pinnedlayer 310 and maintain stability of the memory cell. As previouslydiscussed, the bottom pinned layer 310 may have decreased magnetizationand spin polarization efficiency when heat is applied, such that acurrent may pass the bottom pinned layer 310 with less polarization tobe spin polarized by the top pinned layer 302 and reflected to switchthe free layer 306. The heat from a larger programming current mayreduce magnetization, and a heat generating layer 312 may furtherdecrease the magnetization and spin polarization efficiency of thebottom pinned layer 310. The heat generating layer 312 may also provideantiferromagnetic coupling between the antiferromagnetic layer 314 andthe bottom pinned layer 310.

In another embodiment, as depicted in FIG. 7, a “synthetic free layer”352 replaces a free layer in a memory cell stack 350. As used herein, a“synthetic layer” refers to a structure having a nonmagnetic layersandwiched between two ferromagnetic layers, which may have oppositemagnetization, as described below. Referring again to FIG. 7, thesynthetic free layer 352 may include a top free layer 358 and a bottomfree layer 362 with a nonmagnetic layer 360 in between to promoteantiferromagnetic coupling between the two free layers 358 and 362 suchthat the two free layers 358 and 362 are always opposite inmagnetization. The top free layer 358 is coupled to the top nonmagneticlayer 356, and the bottom free layer 362 is coupled to the bottomnonmagnetic layer 364. Thus, to program the memory cell, the programmingcurrent switches both free layers 358 and 362. Therefore, in thisembodiment, the top pinned layer 354 may be opposite in magnetizationfrom the bottom pinned layer 366.

To program a cell to a low resistance state, a programming currententering the bottom of the stack 350 would be spin polarized by thebottom pinned layer 366 and would flip the bottom free layer 362 andthen the top free layer 358. The bottom free layer 362 would have thesame magnetization as the bottom pinned layer 366. To program a cell toa high resistance state, a large programming current would be applied,and the increased heat from the large programming current, and the heatgenerated by the heat generating layer 368 would decrease themagnetization and spin polarization efficiency of the bottom pinnedlayer 366. Thus, the large programming current would pass the bottompinned layer 366 with low polarization to be spin polarized by the toppinned layer 354, which has an opposite magnetization from the bottompinned layer 366. The spin polarized programming current reflected fromthe top pinned layer 366 would switch the top free layer 358, and thenthe bottom free layer 362. The bottom free layer 362 would have theopposite magnetization as the bottom pinned layer 366. Further, anantiferromagnetic layer 370 may also be added to the memory cell stack350 to help pin the bottom pinned layer 366 and maintain stability ofthe memory cell.

Another embodiment of the present invention, illustrated in FIG. 8,includes a STT-MRAM cell stack 400 with a “synthetic top pinned layer”402 which replaces a top pinned layer in the previously describedembodiments. The synthetic top pinned layer 402 may include a firstpinned layer 404 and a second pinned layer 408 separated by anonmagnetic layer 406. The nonmagnetic layer 406 promotesantiferromagnetic coupling between the surrounding pinned layers 404 and408, and may comprise conductive nonmagnetic material, such as Ru, Irand Re. Because the two pinned layers 404 and 408 of the synthetic toppinned layer 402 are coupled through the nonmagnetic layer 406, the twopinned layers 404 and 408 may be less affected by an incomingprogramming current and will keep magnetization even when temperaturerises or when spin polarization occurs. The pinned layers 404 and 408are thus less susceptible to spin polarizing effects and maintain theirfixed magnetizations, thus improving the memory cell integrity. Anantiferromagnetic layer 420 may also be added to the memory cell stack400 to help pin the bottom pinned layer 416 and maintain stability ofthe memory cell. Further, the heat generating layer also providesantiferromagnetic coupling between the bottom pinned layer 416 and theantiferromagnetic layer 420.

FIG. 9 depicts yet another embodiment of the present invention with anadditional MTJ 452 in a memory cell stack 450. The additional MTJ 452includes a sensing free layer 456 and a pinned layer 460, separated by anonmagnetic barrier layer 458 to insulate the magnetizations of thesensing free layer 456 and the pinned layer 460. The sensing free layer456 is magnetostatically coupled to the free layer 468 to beantiparallel, thus improving the sensing margin. The additional MTJ 452may be separated from the bottom unidirectional programming cell stack454 by a nonmagnetic layer 462, which promotes antiferromagneticcoupling between the surrounding pinned layers 460 and 464. As will beappreciated, the pinned layer 460, the nonmagnetic layer 462 and thepinned layer 464 make up a synthetic top pinned layer 465. The synthetictop pinned layer 465 is a portion of both MTJ 452 and the unidirectionalprogramming cell stack 454.

As known by those skilled in the art, a ferromagnetic layer with amagnetization perpendicular to the plane of the layer may utilize alower programming current to switch magnetization. Thus, anotherembodiment of the present invention may include ferromagnetic layerswith magnetization perpendicular to the layer plane, as depicted in FIG.10. As used herein a “layer plane” refers to the horizontal plane inwhich the associated layer is disposed. A STT-MRAM cell stack 500includes a top pinned layer 502, separated by a top nonmagnetic layer504 from a free layer 506, and a bottom pinned layer 510 separated by abottom nonmagnetic layer 508 from the free layer 506. The stack mayfurther comprise a heat generating layer 512. The unidirectional arrowsillustrated in the top and bottom pinned layers 502 and 510 representtheir fixed magnetization and are oriented perpendicularly to the layerplane. The bidirectional arrow illustrated in the free layer 506represents that the magnetization of the free layer 506 may switch,depending on whether the memory cell is selected to be programmed to alow or high resistance state. As previously described, the structure ofstack 500 enables a unidirectional programming current to switch themagnetization of the free layer 506 in either a direction parallel orantiparallel to the bottom pinned layer 510. Further, a smallerprogramming current may enable such resistance changes due to theperpendicular magnetization of the layers in relation to their layerplanes.

The magnetization of the free layer 506 from FIG. 10 does notnecessarily have to be perpendicular to the plane of the layer in otherembodiments, as illustrated in FIG. 11. In another embodiment, a memorycell stack 550 comprises a top pinned layer 566 and a bottom pinnedlayer 574 having magnetizations perpendicular to the layer plane, and aprogramming free layer 570 having a magnetization parallel to the layerplane. This structure may help to increase the programming speed of thememory cell because of the interaction between the electron spin of theprogramming current and the magnetization of the programming free layer570. Less time is needed for the programming free layer 570 to switch inmagnetization. An additional MTJ 552 with a sensing free layer 560 maybe magnetostatically coupled to the programming free layer 570 to beantiparallel, thus improving the sensing margin between the twoprogrammed states. Further, even if there is no resistance changebetween the magnetizations of the free and pinned layers 566, 570, and574 since the direction of magnetizations are perpendicular, theresistance change may be read from the additional MTJ 552.

As depicted in FIG. 12, STT-MRAM cells may be arranged in an arrayimplementing cross point architecture in accordance with an embodimentof the present invention.

In the architecture 600, a rectifying device 602 is applied to theSTT-MRAM cell 604. The rectifying device 602 may enable a current pathto a selected cell 606 and isolate non-selected cells by blocking thecurrent path. In this embodiment, a diode is used as the rectifyingdevice 602, but any suitable rectifying device or any suitable biasingscheme may be used to enable the current path to a selected cell 606 andblock the current path to non-selected cells.

To program a STT-MRAM cell to a low resistance state, a voltage V1 isapplied to a word line 608 connected to the selected cell 606, and alower voltage V0 is applied to the rest of the word lines. A lowervoltage V0 (a voltage lower than V1) is applied to a bit line 610connected to the selected cell 606 to forward bias the rectifying device612 of the selected cell 606 and create a programming current I1 flowingthrough the selected cell 606. The rest of the bit lines are biased atV1 (or a voltage higher than V0) to reverse bias the other rectifyingdevices and block the current to the non-selected cells. This enablesthe selected STT-MRAM cell 606 to be programmed to a low resistancestate with a unidirectional current, in accordance with the presenttechnique.

To program a STT-MRAM cell to a high resistance state, a voltage V2 isapplied to the word line 608 connected to the selected cell 606. Whenprogramming a selected cell 606 to a high resistance state, the voltageV2 applied across the rectifying device 612 and the selected cell 606 islarger than V1. As previously discussed, this may induce a largerprogramming current I2 through the selected cell 606 to program theselected cell 606 to a high resistance state. The non-selected wordlines are again biased at V0 (a voltage lower than V2), and non-selectedbit lines are biased at V2 (a voltage higher than V0) to reverse biasthe other rectifying devices so that the non-selected cells will not bedisturbed by the write operation. Thus, the selected STT-MRAM cell 606may be programmed to a high resistance state with a unidirectionalcurrent.

While the invention may be susceptible to various modifications andalternative forms, specific embodiments have been shown by way ofexample in the drawings and have been described in detail herein.However, it should be understood that the invention is not intended tobe limited to the particular forms disclosed. Rather, the invention isto cover all modifications, equivalents, and alternatives falling withinthe spirit and scope of the invention as defined by the followingappended claims.

1. A memory cell comprising: a top pinned layer; a bottom pinned layer;a free layer arranged between the top pinned layer and the bottom pinnedlayer; and a heat generating layer coupled directly to the bottom pinnedlayer, wherein the heat generating layer is configured to alter amagnetization of the bottom pinned layer upon activation.
 2. The memorycell, as set forth in claim 1, wherein each of the top pinned layer, thebottom pinned layer and the free layer are ferromagnetic.
 3. The memorycell, as set forth in claim 1, wherein the top pinned layer and thebottom pinned layer are magnetized in the same direction.
 4. The memorycell, as set forth in claim 1, further comprising: a top nonmagneticlayer formed between the top pinned layer and the free layer; and abottom nonmagnetic layer formed between the free layer and the bottompinned layer.
 5. The memory cell, as set forth in claim 1, furthercomprising an antiferromagnetic layer coupled directly to the heatgenerating layer.
 6. The memory cell, as set forth in claim 1, furthercomprising a magnetic tunnel junction formed on the top pinned layer. 7.The memory cell, as set forth in claim 6, comprising anantiferromagnetic layer arranged between the magnetic tunnel junctionand the top pinned layer.
 8. The memory cell, as set forth in claim 6,comprising a spin randomization separation layer arranged between themagnetic tunnel junction and the top pinned layer.
 9. The memory cell,as set forth in claim 6, wherein the magnetic tunnel junction ismagnetostatically coupled to the free layer.
 10. The memory cell, as setforth in claim 6, wherein the magnetic tunnel junction comprises: asensing free layer; a sensing pinned layer; and a nonmagnetic barrierlayer disposed between the sensing free layer and the sensing pinnedlayer.
 11. The memory cell, as set forth in claim 10, wherein themagnetic tunnel junction is magnetostatically coupled to the free layer,such that changing the magnetization of the free layer will change themagnetization of the sensing free layer.
 12. The memory cell, as setforth in claim 1, wherein the free layer comprises a synthetic freelayer.
 13. The memory cell, as set forth in claim 1, wherein the toppinned layer comprises a synthetic pinned layer.
 14. The memory cell, asset forth in claim 1, wherein each of the top pinned layer, the freelayer and the bottom pinned layer is ferromagnetic, and wherein amagnetization of at least one of the top pinned layer, the free layerand the bottom pinned layer is in a direction perpendicular to a layerplane.
 15. The memory cell, as set forth in claim 14, wherein amagnetization of each of the top pinned layer, the free layer and thebottom pinned layer is in a direction perpendicular to a layer plane.16. A memory cell comprising a sensing structure comprising: a heatgenerating layer; a bottom pinned ferromagnetic layer formed on the heatgenerating layer, wherein the heat generating layer is configured toalter a magnetization of the bottom pinned ferromagnetic layer whenactivated; a bottom nonmagnetic layer formed on the bottom pinnedferromagnetic layer; a free ferromagnetic layer formed on the bottomnonmagnetic layer; a top nonmagnetic layer formed on the freeferromagnetic layer; and a top pinned ferromagnetic layer formed on thetop nonmagnetic layer.
 17. The memory cell, as set forth in claim 16,wherein the top pinned ferromagnetic layer and the bottom pinnedferromagnetic layer are magnetized in the same direction.
 18. The memorycell, as set forth in claim 16, further comprising a magnetic tunneljunction formed on the top pinned layer, wherein the magnetic tunneljunction comprises: a sensing free layer; a nonmagnetic barrier layerformed on the sensing free layer; and a sensing pinned layer formed onthe nonmagnetic barrier layer, and wherein the sensing free layer isarranged between the sensing pinned layer and the top pinnedferromagnetic layer.
 19. The memory cell, as set forth in claim 18,further comprising a nonmagnetic spacer layer formed between the toppinned ferromagnetic layer and the sensing pinned layer, wherein the toppinned ferromagnetic layer, the nonmagnetic spacer layer and the sensingpinned layer form a synthetic pinned ferromagnetic layer.
 20. The memorycell, as set forth in claim 19, wherein the top pinned ferromagneticlayer and the sensing pinned layer are magnetized in oppositedirections.
 21. The memory cell, as set forth in claim 16, wherein thefree ferromagnetic layer is a synthetic layer comprising: a top freeferromagnetic layer; a bottom free ferromagnetic layer; and anonmagnetic coupling layer formed therebetween.
 22. The memory cell, asset forth in claim 16, wherein the top pinned ferromagnetic layer is asynthetic layer comprising: an upper top free ferromagnetic layer; alower top free ferromagnetic layer; and a nonmagnetic coupling layerformed therebetween.
 23. The memory cell, as set forth in claim 16,wherein a magnetization of at least of the top pinned ferromagneticlayer, the free ferromagnetic layer and the bottom pinned ferromagneticlayer is in a direction perpendicular to a layer plane.